Jiro Sano

Title: Jiro Sano: Innovator in Wafer Polishing Technology

Introduction

Jiro Sano is a prominent inventor based in Omiya, Japan. He has made significant contributions to the field of wafer polishing technology, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of wafer polishing processes, which are crucial in semiconductor manufacturing.

Latest Patents

Sano's latest patents include an "Apparatus and method for dressing a wafer polishing pad" and a "Wafer polishing apparatus and wafer manufacturing method." The first patent describes an innovative apparatus that includes a disk-shaped dresser, an arm, and a control unit. This apparatus is designed to dress a wafer polishing pad by pressing the dresser against the rotating pad, ensuring optimal performance through frictional force. The second patent outlines a wafer polishing apparatus that enhances the uniformity of polishing wafer surfaces. It features a unique design with a head body, diaphragm, and carrier, which work together to prevent excessive polishing at the wafer's outer edges.

Career Highlights

Jiro Sano is currently employed at Mitsubishi Materials Corporation, where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise in wafer polishing has positioned him as a key figure in advancing manufacturing processes.

Collaborations

Sano has collaborated with notable coworkers, including Kanji Hosoki and Hiroshi Shibaya. Their combined efforts contribute to the innovative environment at Mitsubishi Materials Corporation.

Conclusion

Jiro Sano's contributions to wafer polishing technology exemplify the importance of innovation in the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes, ensuring that the industry continues to evolve and improve.