Jiro Hata

Title: Jiro Hata: Innovator in Plasma Processing Technology

Introduction

Jiro Hata is a prominent inventor based in Yamanashi-ken, Japan. He has made significant contributions to the field of plasma processing, holding a total of 17 patents. His innovative work focuses on methods and apparatuses that enhance the uniformity and efficiency of plasma applications in various technologies.

Latest Patents

Among his latest patents is a method for plasma processing that shapes an induced electric field. This method aims to achieve a highly uniform plasma density on a substrate. It involves positioning the substrate in a processing chamber, supplying high-frequency power to a spiral antenna, generating plasma, and shaping the electric field to ensure uniform plasma distribution. Another notable patent is for a plasma CVD apparatus designed for forming silicon films on LCD substrates. This apparatus features a container divided into process and upper chambers, with a work table in the process chamber where the substrate is mounted. The design includes supply heads for gases and coils that generate electromagnetic fields to transform gases into plasma.

Career Highlights

Jiro Hata has worked with notable companies such as Tokyo Electron Limited and Tokyo Electron Kabushiki Kaisha. His experience in these organizations has allowed him to develop and refine his innovative technologies in plasma processing.

Collaborations

Throughout his career, Hata has collaborated with esteemed colleagues, including Nobuo Ishii and Kiichi Hama. These partnerships have contributed to the advancement of his research and the successful implementation of his inventions.

Conclusion

Jiro Hata's contributions to plasma processing technology have established him as a key figure in the field. His innovative patents and collaborations reflect his commitment to advancing technology and improving processes in various applications.