Jiri Fiala

Title: Jiri Fiala - Innovator in Vacuum System Contamination Reduction

Introduction

Jiri Fiala is a notable inventor based in Blansko, Czech Republic. He has made significant contributions to the field of imaging and analytical devices, particularly in the area of contamination reduction within vacuum systems. His innovative approach has led to the development of a unique method that addresses both organic and inorganic contamination.

Latest Patents

Fiala holds a patent for a method aimed at reducing or removing organic and inorganic contamination from a vacuum system of imaging and analytical devices. The patent describes a process where a photocatalytic layer is applied to the inner surface of the vacuum space. This layer is cooled to a temperature between 0 K and 280 K and is subsequently irradiated with electromagnetic radiation. This process activates a photocatalytic reaction that decomposes contaminants, effectively reducing their concentration in the vacuum space.

Career Highlights

Throughout his career, Jiri Fiala has worked with esteemed institutions such as Masaryk University and Tescan Orsay Holding. His work in these organizations has allowed him to further develop his innovative ideas and contribute to advancements in technology related to vacuum systems.

Collaborations

Fiala has collaborated with notable colleagues, including Pavel Stahel and Mirko Cernak. These partnerships have played a crucial role in enhancing his research and development efforts.

Conclusion

Jiri Fiala's contributions to the field of vacuum system contamination reduction highlight his innovative spirit and dedication to advancing technology. His patented method represents a significant step forward in improving the efficiency and effectiveness of imaging and analytical devices.