Company Filing History:
Years Active: 2003
Title: Innovations by Jiong Xiang in Semiconductor Processing
Introduction
Jiong Xiang is a notable inventor based in Tempe, AZ (US). He has made significant contributions to the field of semiconductor processing, particularly through his innovative methods that enhance the quality and efficiency of semiconductor dielectrics.
Latest Patents
Jiong Xiang holds a patent for a method titled "Long range ordered semiconductor interface phase and oxides." This semiconductor processing method is capable of producing highly ordered, ultra-thin dielectrics, including gate oxide and other semiconductor dielectrics, as well as interphase phases with low defect density. The process involves several steps, including a degrease step, an etch, primary oxidation, and a passivation step that utilizes hydrofluoric acid to passivate the cleaned silicon surface with hydrogen. The resulting dielectric layers exhibit low interface defect density, low flat band voltages, and low fixed charge on semiconductor substrates. He has 1 patent to his name.
Career Highlights
Jiong Xiang is affiliated with the Arizona Board of Regents, a body corporate that oversees higher education in Arizona. His work focuses on advancing semiconductor technologies, which are crucial for various electronic applications.
Collaborations
Jiong has collaborated with talented individuals such as Nicole Herbots and Vasudeva Atluri, contributing to the advancement of semiconductor research and development.
Conclusion
Jiong Xiang's innovative work in semiconductor processing showcases his commitment to enhancing technology in this critical field. His contributions are paving the way for future advancements in semiconductor applications.