Pyeongtaek, South Korea

Jinyoung Chung

This inventor holds 1 USPTO granted patent. Top assignee: Lms Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jinyoung Chung. Retrieved from https://idiyas.com/inventor/jinyoung-chung-fbqgxbe0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Jinyoung Chung: Innovator in Near-Infrared Technology

Introduction

Jinyoung Chung is a notable inventor based in Pyeongtaek-si, South Korea. He has made significant contributions to the field of optical technology, particularly through his innovative patents. His work focuses on enhancing the functionality and efficiency of near-infrared absorbing materials.

Latest Patents

Jinyoung Chung holds a patent for a "Near-infrared ray absorbing article and method for manufacturing thereof, and optical filter and method for manufacturing thereof." This invention relates to a near-infrared absorbing article and an optical filter that utilizes this technology. The near-infrared absorbing article comprises a glass substrate that includes a compressive stress layer of predetermined thickness. This design provides a thin profile while maintaining a certain level of strength, allowing it to be cut using a blade or laser.

Career Highlights

Jinyoung Chung is currently associated with Lms Co., Ltd., where he continues to develop and refine his innovative ideas. His work has positioned him as a key player in the advancement of optical materials and technologies.

Collaborations

He collaborates with talented individuals such as Seonho Yang and Taekwang Park, contributing to a dynamic and innovative work environment.

Conclusion

Jinyoung Chung's contributions to near-infrared technology exemplify the impact of innovative thinking in the field of optics. His patent reflects a commitment to advancing technology and improving material applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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