Shanghai, China

Jinwei Lin

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Tamura Corporation, Tamura Corporation of China Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jinwei Lin. Retrieved from https://idiyas.com/inventor/jinwei-lin-g7noz9xj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Jinwei Lin

Introduction

Jinwei Lin is a notable inventor based in Shanghai, China. He has made significant contributions to the field of technology, particularly with his innovative designs and patents. His work has been recognized in various industries, showcasing his expertise and creativity.

Latest Patents

Jinwei Lin holds a patent for a "Coil for substrate mounting." This invention demonstrates his ability to create practical solutions that enhance the functionality of electronic devices. With only one patent to his name, it is clear that his work is both specialized and impactful.

Career Highlights

Throughout his career, Jinwei Lin has worked with reputable companies, including Tamura Corporation and Tamura Corporation of China Limited. His experience in these organizations has allowed him to develop his skills and contribute to various projects that push the boundaries of technology.

Collaborations

Jinwei Lin has collaborated with talented individuals such as Hideto Saeki and Junji Kondo. These partnerships have likely enriched his work and provided opportunities for innovative ideas to flourish.

Conclusion

Jinwei Lin's contributions to the field of invention, particularly with his patent for a coil for substrate mounting, highlight his innovative spirit and dedication to technology. His collaborations and career experiences further emphasize his role as a significant figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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