Jingyi Li

Title: Innovations of Jingyi Li in Semiconductor Manufacturing

Introduction

Jingyi Li is an accomplished inventor based in San Jose, CA, specializing in semiconductor manufacturing technologies. With a focus on dielectric material deposition, she has made significant contributions to the field, holding 2 patents that enhance the efficiency and effectiveness of semiconductor device fabrication.

Latest Patents

Jingyi Li's latest patents include innovative methods for depositing dielectric material. These methods utilize RF bias pulses in conjunction with remote plasma source deposition, specifically designed for manufacturing semiconductor devices. The techniques are particularly effective for filling openings with high aspect ratios in semiconductor applications. One embodiment of her method involves providing a gas mixture into a processing chamber, forming a remote plasma, and applying RF bias power in pulsed mode to create a dielectric material in openings defined in a material layer on the substrate.

Career Highlights

Jingyi Li is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing industry. Her work focuses on advancing technologies that improve the deposition processes critical to semiconductor device performance.

Collaborations

Jingyi collaborates with talented coworkers, including Bhargav S Citla and Jethro Tannos, who contribute to her innovative projects and research efforts.

Conclusion

Jingyi Li's contributions to semiconductor manufacturing through her patented methods for dielectric material deposition exemplify her expertise and commitment to innovation in the field. Her work continues to influence the development of advanced semiconductor technologies.