Company Filing History:
Years Active: 2007
Title: Innovations by Jingyi (Jenny) Bai in Photolithography Techniques
Introduction
Jingyi (Jenny) Bai, an inventive mind based in San Jose, CA, has made notable contributions to the field of integrated circuit fabrication. As an inventor with a patent to his name, Jingyi has developed a sophisticated technique that enhances photolithography features, showcasing his expertise in the area of microfabrication.
Latest Patents
Jingyi Bai holds a patent titled "Pitch Reduced Patterns Relative to Photolithography Features." This innovation involves a unique method for forming differently-sized features on an integrated circuit. The process utilizes pitch multiplication to create smaller features through etching a substrate using a specially designed mask. This mask combines two separately formed patterns, utilizing both pitch multiplication for reduced features and conventional photolithography for larger ones. The method effectively integrates advanced techniques into photolithography, making it a significant advancement in semiconductor manufacturing.
Career Highlights
Currently, Jingyi Bai is a valuable member of Micron Technology Incorporated, a leading company in semiconductor technology. His work focuses on enhancing the efficiency and precision of integrated circuit production, contributing to the evolution of microelectronics. With one patent to his name, Jingyi has demonstrated an impressive ability to innovate in a rapidly advancing technological landscape.
Collaborations
Throughout his career, Jingyi has collaborated with accomplished colleagues such as Luan C Tran and William T Rericha. These professional relationships foster an environment of creativity and innovation, allowing them to collectively push the boundaries of what is possible in the field of semiconductor research and development.
Conclusion
In conclusion, Jingyi (Jenny) Bai's inventive work in photolithography techniques represents a significant leap forward in integrated circuit fabrication. His patent not only reflects his ingenuity but also enhances the capabilities of photolithography in semiconductor manufacturing. As he continues to collaborate with talented professionals at Micron Technology Incorporated, the future of innovations in this field looks promising.