Tianjin, China

Jingye Kang

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jingye Kang. Retrieved from https://idiyas.com/inventor/jingye-kang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:

goldMedal1 out of 834,513 
Other
 patents

Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Innovations of Jingye Kang in Chemical-Mechanical Planarization

Introduction

Jingye Kang is a notable inventor based in Tianjin, China. He has made significant contributions to the field of chemical-mechanical planarization, particularly in the polishing of sapphire surfaces. His innovative approach has led to the development of a unique slurry that enhances the precision and efficiency of sapphire finishing processes.

Latest Patents

Jingye Kang holds a patent for a slurry designed for chemical-mechanical planarization of sapphire. The patent describes an aqueous chemical-mechanical polishing slurry that includes a chelating agent with 13 chelate rings. This agent has a strong affinity for complexing with aluminum ions, resulting in a water-soluble chelate product. The slurry achieves a removal rate of 10-16 µm/h and reduces surface roughness to 0.1 nm. The components of the slurry include silica sol (1-90 wt. %), alkali modifier (0.25-5 wt. %), ether-alcohol activator (0.5-10 wt. %), chelating agent (1.25-15 wt. %), and deionized water. This formulation allows for high precision finishing of sapphire surfaces, meeting industrial requirements while being environmentally friendly and cost-effective.

Career Highlights

Throughout his career, Jingye Kang has focused on advancing the technology behind sapphire surface finishing. His innovative slurry not only improves the efficiency of the polishing process but also minimizes environmental impact. His work has positioned him as a key figure in the field of chemical-mechanical planarization.

Collaborations

Jingye Kang has collaborated with notable colleagues such as Yuling Liu and Bomei Tan. Their combined expertise has contributed to the successful development and application of the polishing slurry.

Conclusion

Jingye Kang's contributions to the field of chemical-mechanical planarization exemplify the impact of innovative thinking in industrial applications. His patented slurry represents a significant advancement in the polishing of sapphire surfaces, showcasing his dedication to improving manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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