Company Filing History:
Years Active: 2021
Title: Innovations of Jinggang Li in Electro-Chemical Plating
Introduction
Jinggang Li is a notable inventor based in Singapore, SG. He has made significant contributions to the field of electro-chemical plating. With a focus on innovative methods, he has developed a unique approach that enhances the efficiency of plating processes.
Latest Patents
Jinggang Li holds a patent for a "Method of Electro-Chemical Plating." This method involves delivering the catholyte to the cathode chamber while controlling its temperature before it flows into the chamber. The anolyte is provided at room temperature and is subsequently cooled to a second temperature before entering the anode chamber. This second temperature is equal to or lower than the first temperature. The substrate's plating surface is immersed in the electrolyte, and a direct current (DC) voltage is applied to the biased substrate, attracting metal ions from the electrolyte to the plating surface for electroplating.
Career Highlights
Jinggang Li is associated with United Semiconductor (Xiamen) Co., Ltd., where he applies his expertise in electro-chemical processes. His innovative work has positioned him as a key figure in the semiconductor industry.
Collaborations
Jinggang Li collaborates with talented professionals such as Shouguo Zhang and Yongbo Xu. Their combined efforts contribute to advancements in their field.
Conclusion
Jinggang Li's contributions to electro-chemical plating demonstrate his innovative spirit and commitment to advancing technology. His patent reflects a significant step forward in the efficiency of plating methods.