Company Filing History:
Years Active: 2014
Title: Innovations of Jingbing Liu in Plasma Discharge Technology
Introduction
Jingbing Liu is a notable inventor based in Beijing, China. He has made significant contributions to the field of plasma discharge technology. His innovative approach has led to advancements that enhance the uniformity of high-frequency plasma discharges.
Latest Patents
Jingbing Liu holds a patent titled "Method for improving uniformity of high-frequency plasma discharge by means of frequency modulation." This patent describes a method that utilizes a pair of parallel electrodes within a plasma discharge chamber. A high-frequency power supply feeds the electrodes, operating within a frequency range of 13.56 MHz to 160 MHz. The method involves inputting discharge gas to form plasma, while the frequency of the high-frequency electromagnetic field is under automatic tuning control. This frequency changes cyclically during the plasma discharge process, ensuring that the average plasma density between the parallel electrodes remains uniform over time.
Career Highlights
Jingbing Liu is affiliated with the Beijing University of Technology, where he continues to engage in research and development in his field. His work has garnered attention for its practical applications in various industries that utilize plasma technology.
Collaborations
Jingbing Liu collaborates with esteemed colleagues, including Bo Wang and Lichun Xu. Their combined expertise contributes to the advancement of research in plasma discharge technology.
Conclusion
Jingbing Liu's innovative methods in plasma discharge technology demonstrate his commitment to enhancing the efficiency and uniformity of high-frequency plasma applications. His contributions are valuable to both academic and industrial sectors.