Zhubei, Taiwan

Jing Ru Hong

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations by Jing Ru Hong in Semiconductor Processing

Introduction

Jing Ru Hong is a notable inventor based in Zhubei, Taiwan. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of semiconductor wafer processing.

Latest Patents

Jing Ru Hong holds a patent titled "Systems and methods for processing semiconductor wafers using front-end processed wafer edge geometry metrics." This patent describes a method for processing semiconductor wafers that involves obtaining measurement data of an edge profile from a semiconductor wafer processed by a front-end process tool. The method includes determining an edge profile center point based on the measurement data, generating a raw height profile, and creating an ideal edge profile. Furthermore, it involves generating a Gapi edge profile based on the raw height profile and the ideal edge profile, as well as calculating a Gapi edge value of the semiconductor wafer. The generated Gapi edge profile and the calculated Gapi edge value can be utilized to tune the front-end process tool and sort the semiconductor wafer for polishing.

Career Highlights

Jing Ru Hong is currently employed at GlobalWafers Co., Ltd., where he applies his expertise in semiconductor technology. His innovative approach has led to advancements in the processing of semiconductor wafers, contributing to the overall efficiency of the manufacturing process.

Collaborations

Jing Ru Hong collaborates with talented colleagues, including Yung Hsing Chu and Yen-Chun Chou, who contribute to the innovative environment at GlobalWafers Co., Ltd. Their teamwork fosters a culture of creativity and technological advancement.

Conclusion

Jing Ru Hong's contributions to semiconductor processing through his patent demonstrate his commitment to innovation in the field. His work not only enhances the efficiency of semiconductor wafer processing but also showcases the importance of collaboration in driving technological advancements.

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