Company Filing History:
5 out of 1,415 
2 out of 58 
Years Active: 2012-2023
Title: Jing Lu: Innovator in Microwave Plasma Technology
Introduction
Jing Lu is a prominent inventor based in East Lansing, MI (US), known for his contributions to microwave plasma technology. With a total of 5 patents, he has made significant advancements in the field of chemical vapor deposition.
Latest Patents
One of Jing Lu's latest patents focuses on methods and apparatus for microwave plasma assisted chemical vapor deposition reactors. This innovation relates to microwave cavity plasma reactor (MCPR) apparatus and associated tuning and process control methods that enable the microwave plasma assisted chemical vapor deposition (MPACVD) of components such as diamond. The related methods allow for the control of the microwave discharge position, size, and shape, facilitating efficient matching of the incident microwave power into the reactor prior to and during component deposition. Pre-deposition tuning processes ensure a well-matched reactor that exhibits high plasma reactor coupling efficiency over a wide range of operating conditions. This allows operational input parameters to be modified during deposition while maintaining the reactor in a well-matched state. Additionally, the processes are directed towards real-time process control during deposition, based on identified independent process variables that can effectively control desired dependent process variables while maintaining a well-matched power coupling reactor state.
Career Highlights
Jing Lu has worked with notable institutions such as Michigan State University and Fraunhofer USA, Inc. His work has significantly impacted the field of microwave plasma technology, enhancing the efficiency and effectiveness of chemical vapor deposition processes.
Collaborations
Some of his notable coworkers include Jes Asmussen and Yajun Gu, who have collaborated with him on various projects, contributing to the advancement of their shared field.
Conclusion
Jing Lu's innovative work in microwave plasma technology and his contributions to chemical vapor deposition processes highlight his role as a leading inventor in this specialized area. His patents and collaborations continue to influence advancements in the field.
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