This inventor holds 1 USPTO granted patent. Top assignee: Nan Ya Technology Corporation. Active years: 2010.
Company Filing History:
Years Active: 2010
Title: Innovations of Jing-Kae Liou
Introduction
Jing-Kae Liou is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a patented method that enhances transistor structures.
Latest Patents
Jing-Kae Liou holds a patent for a "Method for forming bit-line contact plug and transistor structure." This method involves providing a substrate that includes a transistor with a gate structure and source/drain at both sides of the gate structure. The process includes forming a conductive layer, a bit-line contact material layer, and a hard mask layer. An etching process is performed using the conductive layer as an etching stop layer to etch the bit-line contact material layer and the hard mask layer, ultimately forming the bit-line contact plug on the source/drain.
Career Highlights
Liou is currently employed at Nan Ya Technology Corporation, where he continues to work on advancements in semiconductor technology. His expertise in this area has positioned him as a valuable asset to his company and the industry.
Collaborations
Some of his coworkers include Yu-Chung Fang and Hong-Wen Lee, who contribute to the innovative environment at Nan Ya Technology Corporation.
Conclusion
Jing-Kae Liou's contributions to semiconductor technology through his patent and work at Nan Ya Technology Corporation highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of transistor structures.