This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Jing Guo and Lithography Stitching
Introduction
Jing Guo is an inventor associated with Fremont, California, and Applied Materials, Inc. The supplied information identifies one patent associated with Guo.
Latest Patents
Guo’s patent, “Lithography stitching,” describes a method for forming patterned features on a substrate using multiple masks. Radiation passes through patterned areas of the masks to create successive patterned regions, enabling the features to be formed across different portions of the substrate. The patent record lists 1 patent.
Career Highlights
The available information connects Guo’s invention to Applied Materials, Inc., a company involved in materials engineering and semiconductor manufacturing technologies. The lithography method addresses the precise formation of patterned regions on a substrate.
Collaborations
The supplied data names Yongan Xu and William Wilkinson as Guo’s coworkers. It does not specify their roles in the patent or the nature of their collaboration.
Conclusion
Jing Guo’s listed patent presents a mask-based lithography method for forming patterned features across a substrate, reflecting work associated with Applied Materials, Inc.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile