Skokie, IL, United States of America

Jing Chen


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Inventor Jing Chen

Introduction

Jing Chen is a notable inventor based in Skokie, Illinois, with a focus on advancing technologies in the field of electronic devices. He holds a significant patent that emphasizes the application of polymeric materials in enhancing the performance of metal-oxide-semiconductor field-effect transistors (MOSFETs). His work stands out for its potential impact on the efficiency and functionality of various electronic components.

Latest Patents

Jing Chen has been granted one patent, which addresses the development of polysulfone-based materials specifically designed for use in MOSFETs. This patent, titled “Polymeric materials for use in metal-oxide-semiconductor field-effect transistors,” presents a novel approach where these materials can serve as active and/or passive components in electronic devices. The invention offers exceptional performance capabilities when these materials are utilized as dielectric and passivation layers in MOSFETs, enhancing their overall effectiveness.

Career Highlights

Currently, Jing Chen is associated with Polyera Corporation, a firm known for its innovation in materials science and technology. His position within this company allows him to contribute significantly to research and development, particularly in the domain of polymer-based materials used in advanced electronic applications.

Collaborations

Throughout his career, Jing has collaborated with esteemed colleagues such as Antonio Facchetti and Daniel Batzel. These partnerships highlight a shared commitment to pioneering research and innovation in electronic materials, further enhancing the efficacy of electronic devices through advanced materials development.

Conclusion

Jing Chen’s contributions to the field of electronic materials, particularly through his patented innovation in polysulfone-based materials for MOSFETs, reflect his dedication and expertise as an inventor. His work at Polyera Corporation and collaboration with other industry professionals underscore the collaborative nature of technological advancements in electronics, promising a brighter future for the implementation of innovative materials in various electronic applications.

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