Company Filing History:
Years Active: 1995-1999
Title: Innovations of Jin-Young Kang in Semiconductor Technology
Introduction
Jin-Young Kang is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His innovative methods have advanced the fabrication processes used in semiconductor devices.
Latest Patents
One of Jin-Young Kang's latest patents is a method for fabricating a field oxide isolation region for semiconductors. This method involves several steps, including the formation of a pad oxide film, a polysilicon film, and an insulating layer on a silicon substrate. The insulating layer consists of a first silicon oxide film, a nitride film, and a second silicon oxide film. The process defines active and inactive regions using a patterned photomask and removes the insulating layer only on the inactive region to expose the polysilicon film. A side wall is formed at both edges of the insulating layer on the active region, and a third silicon oxide film is deposited. The substrate is then etched to form a trench, which is filled with an insulating material to create an isolating film. This innovative approach ensures that no oxygen penetrates into the active region during thermal oxidation, allowing for the formation of a field oxide film without the occurrence of a Bird's beak.
Career Highlights
Throughout his career, Jin-Young Kang has worked with notable organizations, including the Electronics and Telecommunications Research Institute and the Korea Telecommunication Authority. His work in these institutions has allowed him to develop and refine his innovative techniques in semiconductor fabrication.
Collaborations
Jin-Young Kang has collaborated with several professionals in his field, including Byung-Ryul Ryum and Tae-Hyeon Han. These collaborations have contributed to the advancement of semiconductor technologies and the successful implementation of his patented methods.
Conclusion
Jin-Young Kang's contributions to semiconductor technology through his innovative patents have significantly impacted the industry. His methods for fabricating isolation regions in semiconductor devices demonstrate his expertise and commitment to advancing technology.