Jin-wook Park

Title: Inventor Jin-wook Park: Innovating Semiconductor Technology

Introduction

Jin-wook Park is a prominent inventor based in Seoul, South Korea. With a strong background in semiconductor technology, he has made significant contributions through his innovative work. Jin-wook holds a patent that showcases his expertise in forming oxide layers, which is crucial in the fabrication of semiconductor devices.

Latest Patents

Jin-wook Park's notable patent is titled "Method of forming oxide layer and method of fabricating semiconductor device." This invention outlines a method that includes forming a first material layer on a semiconductor substrate, using a polysiloxane material. The patent details a process where a percentage of Si-H bonds within the polysiloxane material ranges from about 40% to about 90%. The method involves a two-step annealing process, first in an inert atmosphere followed by an oxidative atmosphere, enhancing the efficiency of semiconductor devices.

Career Highlights

Throughout his career, Jin-wook has worked with renowned companies, including Samsung Electronics Co., Ltd. and Adeka Corporation. His tenure at these institutions allowed him to develop and apply advanced technology in semiconductor fabrication, leading to his recognized patent.

Collaborations

During his journey, Jin-wook has collaborated with esteemed colleagues such as Tae-jin Yim and Youn-Joung Cho. These partnerships have contributed to the innovative work that Jin-wook has produced, allowing for the exchange of ideas and development of cutting-edge technology.

Conclusion

Jin-wook Park stands out as an influential figure in semiconductor innovation. His patent on the method of forming oxide layers is a testament to his commitment to advancing technology. Through his career and collaborations, he continues to impact the field of semiconductor devices significantly.