Santa Clara, CA, United States of America

Jin Sun

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin Sun. Retrieved from https://idiyas.com/inventor/jin-sun-z9v3an1t

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations by Jin Sun in Display Technology

Introduction

Jin Sun is an accomplished inventor based in Santa Clara, CA. He has made significant contributions to the field of display technology, particularly in the measurement of flatness in chemical vapor deposition (CVD) chambers. His innovative approach has led to the development of a unique flexible support system that enhances measurement accuracy.

Latest Patents

Jin Sun holds 1 patent for his invention titled "Measurement of flatness of a susceptor of a display CVD chamber." This patent describes a flexible support designed to aid in measuring the flatness of a susceptor. The invention features two support blocks with apertures and a support pin that allows for controlled movement between the blocks, ensuring precise measurements.

Career Highlights

Jin Sun is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display technology sectors. His work focuses on improving the efficiency and accuracy of manufacturing processes in the display industry. His innovative contributions have positioned him as a valuable asset to his team and the company.

Collaborations

Jin collaborates with talented colleagues, including Stanley Wu and Shih Chang Chen. Their combined expertise fosters a creative environment that drives innovation and enhances project outcomes.

Conclusion

Jin Sun's contributions to display technology through his innovative patent demonstrate his commitment to advancing the field. His work at Applied Materials, Inc. continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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