Yongin, South Korea

Jin Joo

This inventor holds 1 USPTO granted patent. Top assignee: Ligadp Co., Ltd.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin Joo. Retrieved from https://idiyas.com/inventor/jin-joo-4o896ge9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Jin Joo - Innovator in Metal Organic Chemical Vapor Deposition Technology

Introduction

Jin Joo is a prominent inventor based in Yongin, South Korea. He has made significant contributions to the field of chemical vapor deposition technology. His innovative work has led to the development of a unique apparatus that enhances the deposition of nitride layers on substrates.

Latest Patents

Jin Joo holds a patent for a "Metal Organic Chemical Vapor Deposition Apparatus and Method." This invention includes reaction chambers where nitride layers are deposited on a substrate using a group III-V material. The apparatus features a buffer chamber connected to the reaction chambers, which houses a transfer robot for substrate movement. Additionally, it includes a gas supply device that selectively supplies hydrogen, nitrogen, and ammonia gases into the buffer chamber. This design ensures that the buffer chamber maintains the same atmosphere as the reaction chamber during substrate transfer, allowing for stable maintenance of epitaxial layers.

Career Highlights

Jin Joo is associated with Ligadp Co., Ltd., where he continues to advance his research and development efforts. His work in the field of chemical vapor deposition has positioned him as a key figure in the industry. His innovative approaches have garnered attention and recognition within the scientific community.

Collaborations

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Conclusion

Jin Joo's contributions to metal organic chemical vapor deposition technology exemplify his innovative spirit and dedication to advancing the field. His patent reflects a significant step forward in the efficient deposition of nitride layers, showcasing his expertise and commitment to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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