Dunwoody, GA, United States of America

Jin Hyun Hwang

This inventor holds 1 USPTO granted patent. Top assignee: Georgia Tech Research Corporation. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin Hyun Hwang. Retrieved from https://idiyas.com/inventor/jin-hyun-hwang-d7ol4tr2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: The Innovations of Jin Hyun Hwang

Introduction

Jin Hyun Hwang is a notable inventor based in Dunwoody, GA (US). He has made significant contributions to the field of integrated circuits and system architectures. His work focuses on reducing electromagnetic interference and noise, which is crucial for the advancement of technology.

Latest Patents

Hwang holds a patent for "Ferroelectrics and ferromagnetics for noise isolation in integrated circuits, packaging, and system architectures." This patent discloses innovative ferroelectric and ferromagnetic noise isolation structures that effectively reduce electromagnetic interference and noise in integrated circuit devices. The representative structures include two or more devices that are vertically arranged, with a thin ferroelectric or ferromagnetic film layer placed between them to isolate electromagnetic energy coupling.

Career Highlights

Jin Hyun Hwang is affiliated with the Georgia Tech Research Corporation, where he continues to push the boundaries of research and innovation. His work has garnered attention for its practical applications in enhancing the performance of electronic devices.

Collaborations

Hwang collaborates with esteemed colleagues such as Markondeya Raj Pulugurtha and Madhaven Swaminathan. Their combined expertise contributes to the advancement of research in the field of integrated circuits.

Conclusion

Jin Hyun Hwang's contributions to the field of integrated circuits through his innovative patent demonstrate his commitment to enhancing technology. His work not only addresses current challenges but also paves the way for future advancements in electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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