Jin Hwan Ham

Title: Innovations of Jin Hwan Ham in Plasma Processing Technology

Introduction

Jin Hwan Ham is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of plasma processing technology, particularly in the etching of silicon. His innovative methods have the potential to enhance the efficiency and quality of semiconductor manufacturing processes.

Latest Patents

Jin Hwan Ham holds a patent for a method aimed at achieving smooth side walls after the Bosch etch process. This method involves several steps, including a first vertical etch to create a hole in silicon, followed by the deposition of a protective layer on the sidewall. The process continues with a second vertical etch to deepen the hole and create a second sidewall, which features a unique structure with troughs and a peak. Finally, a third etch is performed to reduce the peak, resulting in improved sidewall smoothness.

Career Highlights

Jin Hwan Ham is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work focuses on advancing etching techniques that are crucial for the production of high-performance electronic devices. His expertise in plasma processing has positioned him as a valuable asset in the field.

Collaborations

Jin Hwan Ham has collaborated with several professionals in his field, including Jaroslaw Walery Winniczek and Frank Lin. These collaborations have fostered innovation and the sharing of knowledge, contributing to advancements in semiconductor technology.

Conclusion

Jin Hwan Ham's contributions to plasma processing technology, particularly through his patented methods, highlight his role as an influential inventor in the semiconductor industry. His work continues to pave the way for improvements in manufacturing processes, showcasing the importance of innovation in technology.