Xiamen, China

Jin Huo Liao

This inventor holds 1 USPTO granted patent. Top assignee: Tpk Advanced Solutions Inc.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin Huo Liao. Retrieved from https://idiyas.com/inventor/jin-huo-liao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Jin Huo Liao: Innovator in Electronic Device Manufacturing

Introduction

Jin Huo Liao is a notable inventor based in Xiamen, China. He has made significant contributions to the field of electronic devices, particularly through his innovative patent. His work reflects a commitment to advancing technology and improving user experience in electronic products.

Latest Patents

Jin Huo Liao holds a patent for an electronic device and method of manufacturing the same. This electronic device features a cover plate assembly, a frameless display panel assembly, and an adhesive layer. The design includes a closed space formed by pressing the components together, with a spacing smaller than 200 microns. This innovation enhances the functionality and aesthetics of electronic devices.

Career Highlights

Jin Huo Liao is associated with TPK Advanced Solutions Inc., where he applies his expertise in electronic device manufacturing. His role at the company allows him to collaborate with other talented professionals in the industry. His contributions have been instrumental in developing cutting-edge technologies.

Collaborations

Jin Huo Liao has worked alongside notable colleagues such as Chih Sheng Wang and Li Hung Chang. Their collaborative efforts have fostered an environment of innovation and creativity within their projects.

Conclusion

Jin Huo Liao's work exemplifies the spirit of innovation in the electronic device sector. His patent and career achievements highlight his dedication to advancing technology. His contributions will continue to influence the industry for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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