Gyeonggi-do, South Korea

Jin Chul Son

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Psk Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin Chul Son. Retrieved from https://idiyas.com/inventor/jin-chul-son-p5bh7u4l

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Jin Chul Son: Innovator in Substrate Processing Technology

Introduction

Jin Chul Son is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Jin Chul Son holds a patent for a substrate processing apparatus. This apparatus includes a chamber with a processing space, a support unit for holding the substrate, a gas supply unit for delivering process gas, and a plasma generation unit. The plasma generation unit is designed with an inner coil part and an outer coil part, which work together to generate plasma from the process gas. This invention is crucial for improving the quality and efficiency of substrate processing.

Career Highlights

Jin Chul Son is currently employed at Psk Inc., where he continues to innovate and develop new technologies. His work has been instrumental in advancing substrate processing techniques, making him a valuable asset to his company and the industry.

Collaborations

Throughout his career, Jin Chul Son has collaborated with talented individuals such as A Ram Kim and Young Tak Yoon. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Jin Chul Son's contributions to substrate processing technology exemplify his dedication to innovation. His patent for a substrate processing apparatus showcases his ability to solve complex problems in the field. As he continues to work at Psk Inc., his future endeavors are likely to yield even more groundbreaking advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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