Jin Chul Son

Title: Innovations by Jin Chul Son

Introduction

Jin Chul Son is a notable inventor based in Hwasung-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of dielectric film stacks for 3D NAND structures. With a total of 2 patents to his name, his work has had a considerable impact on the industry.

Latest Patents

One of Jin Chul Son's latest patents is focused on the VNAND tensile thick TEOS oxide. This patent describes an improved method for forming a dielectric film stack used for inter-level dielectric (ILD) layers in a 3D NAND structure. The method involves providing a substrate with a gate stack deposited thereon, forming a first oxide layer on the exposed surfaces of the gate stack using a specific RF power and a process gas that includes TEOS and an oxygen-containing gas. Additionally, a second oxide layer is formed over the first using a different RF power and a process gas comprising silane and another oxygen-containing gas.

Career Highlights

Jin Chul Son is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to push the boundaries of technology and contribute to advancements in semiconductor manufacturing processes.

Collaborations

Throughout his career, Jin Chul Son has collaborated with several talented individuals, including Michael Wenyoung Tsiang and Praket Prakash Jha. These collaborations have fostered innovation and have been instrumental in the development of new technologies in the semiconductor field.

Conclusion

Jin Chul Son's contributions to the semiconductor industry through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of technology in significant ways.