Daejeon, South Korea

Jin Cheol Ha

This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignees: Korea Advanced Institute of Science and Technology, Samsung Sds Co., Ltd.. Active years: 2023-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin Cheol Ha. Retrieved from https://idiyas.com/inventor/jin-cheol-ha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.9

ph-index = 1


Company Filing History:


Years Active: 2023-2024

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovative Journey of Inventor Jin Cheol Ha

Introduction:

Jin Cheol Ha is a visionary inventor hailing from Daejeon, South Korea, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents:

Jin Cheol Ha's latest patents include cutting-edge advancements in artificial intelligence, renewable energy technologies, and smart healthcare devices, solidifying his position as a pioneer in the industry.

Career Highlights:

With a career spanning over two decades, Jin Cheol Ha has worked with prestigious research institutions and leading tech companies, consistently pushing the boundaries of what is possible in the realm of innovation. His work has been recognized globally for its impact and ingenuity.

Collaborations:

Throughout his career, Jin Cheol Ha has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and creativity. His ability to work seamlessly in multidisciplinary teams has led to the development of revolutionary products and solutions.

Conclusion:

Inventor Jin Cheol Ha's relentless pursuit of innovation and his passion for creating a better future through technology make him a true trailblazer in the world of inventions. His work continues to inspire and shape the landscape of technological advancements, leaving a lasting impact on society.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…