This inventor holds 7 USPTO granted patents and 3 EPO patents. Top assignees: Samsung Electronics Co., Ltd., Korea Advanced Institute of Science and Technology. Active years: 2003-2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Gunpo-si, KR (2004 - 2007)
- Seoul, KR (2003 - 2013)
Company Filing History:
5 out of 132,108 
3 out of 2,795 
Years Active: 2003-2013
Title: Innovations of Jin-Baek Kim
Introduction
Jin-Baek Kim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of photoresist compositions and pattern formation. With a total of 7 patents to his name, his work has had a considerable impact on the technology sector.
Latest Patents
One of his latest patents is titled "Methods of forming a pattern using negative-type photoresist compositions." This method involves forming a photoresist film on a substrate by coating it with a photoresist composition that includes a polymer, a photoacid generator, and a solvent. The polymer contains an alkoxysilyl group as a side chain, which allows it to be cross-linkable by an acid, making it insoluble in a developer. The process includes curing a portion of the photoresist film by exposing it to light, followed by the application of a developer to remove the unexposed areas, thus creating a photoresist pattern on the substrate.
Another notable patent is "Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same." This patent describes a photoresist composition that includes a cyclic compound, a photoacid generator, and an organic solvent. The cyclic compound consists of various moieties with specific chemical structures, enhancing the effectiveness of the photoresist composition.
Career Highlights
Jin-Baek Kim has worked with leading companies in the technology sector, including Samsung Electronics and the Korea Advanced Institute of Science and Technology. His experience in these organizations has allowed him to develop innovative solutions in the field of photoresist technology.
Collaborations
Throughout his career, Jin-Baek Kim has collaborated with notable colleagues, including Tae-Hwan Oh and Jae-Jun Lee. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Jin-Baek Kim's contributions to the field of photoresist compositions and pattern formation demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a deep understanding of chemical processes and their applications in modern technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile