Company Filing History:

5 out of 131,906

Samsung Electronics Co., Ltd.

patents

3 out of 2,623

Korea Advanced Institute of Science and Technology

patents

where one patent can have more than one assignee

Years Active: 2003-2013

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7 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8377626 - Methods of forming a pattern using negative-type photoresist compositions (2013-02-19),

2. 7670748 - Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same (2010-03-02),

3. 7312839 - Light guiding plate, liquid crystal display device using the same, and method for displaying pictures thereof (2007-12-25),

4. 7280172 - Light guide plate, liquid crystal display device having the same, and method for displaying an image using the liquid crystal display device (2007-10-09),

5. 6936402 - MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS (2005-08-30),

6. 6752504 - Illumination device and reflection type liquid crystal display device using the same (2004-06-22),

7. 6607867 - Organometal-containing norbornene monomer, photoresist containing its polymer, manufacturing method thereof, and method of forming photoresist patterns (2003-08-19),

Title: Innovations of Jin-Baek Kim

Introduction

Jin-Baek Kim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of photoresist compositions and pattern formation. With a total of 7 patents to his name, his work has had a considerable impact on the technology sector.

Latest Patents

One of his latest patents is titled "Methods of forming a pattern using negative-type photoresist compositions." This method involves forming a photoresist film on a substrate by coating it with a photoresist composition that includes a polymer, a photoacid generator, and a solvent. The polymer contains an alkoxysilyl group as a side chain, which allows it to be cross-linkable by an acid, making it insoluble in a developer. The process includes curing a portion of the photoresist film by exposing it to light, followed by the application of a developer to remove the unexposed areas, thus creating a photoresist pattern on the substrate.

Another notable patent is "Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same." This patent describes a photoresist composition that includes a cyclic compound, a photoacid generator, and an organic solvent. The cyclic compound consists of various moieties with specific chemical structures, enhancing the effectiveness of the photoresist composition.

Career Highlights

Jin-Baek Kim has worked with leading companies in the technology sector, including Samsung Electronics and the Korea Advanced Institute of Science and Technology. His experience in these organizations has allowed him to develop innovative solutions in the field of photoresist technology.

Collaborations

Throughout his career, Jin-Baek Kim has collaborated with notable colleagues, including Tae-Hwan Oh and Jae-Jun Lee. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Jin-Baek Kim's contributions to the field of photoresist compositions and pattern formation demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a deep understanding of chemical processes and their applications in modern technology.

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