The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2005
Filed:
Feb. 24, 2004
Applicants:
Jin-baek Kim, Seoul, KR;
Tae-hwan OH, Gangwon-do, KR;
Jae-hak Choi, Daejeon, KR;
Jae-jun Lee, Kyunggi-do, KR;
Inventors:
Jin-Baek Kim, Seoul, KR;
Tae-Hwan Oh, Gangwon-do, KR;
Jae-Hak Choi, Daejeon, KR;
Jae-Jun Lee, Kyunggi-do, KR;
Assignee:
Korea Advanced Institute Science & Technology, Daejeon, KR;
Primary Examiner:
Int. Cl.
CPC ...
G03C001/73 ; G03F007/039 ; G03F007/20 ; G03F007/30 ; C07D313/06 ; C08F024/00 ;
U.S. Cl.
CPC ...
Abstract
Disclosed herein is a novel norbornene, acrylate or methacrylate monomer as a photoresist monomer containing an oxepan-2-one group. Further disclosed are photoresist compositions comprising a polymer prepared from the monomer, methods for preparing the photoresist compositions, and methods for forming photoresist patterns using the photoresist compositions.