Location History:
- Jinju-shi, KR (2003)
- Kyunggi-do, KR (2005)
Company Filing History:
Years Active: 2003-2005
Title: Jae-Jun Lee: Innovator in Photoresist Technology
Introduction
Jae-Jun Lee is a prominent inventor based in Kyunggi-do, South Korea. He has made significant contributions to the field of photoresist technology, particularly through his innovative patents. With a total of 2 patents, Lee's work focuses on advancing materials used in photolithography processes.
Latest Patents
Lee's latest patents include groundbreaking developments in photoresist compositions. One of his notable inventions is a novel norbornene, acrylate, or methacrylate monomer that contains an oxepan-2-one group. This invention is crucial for creating photoresist compositions that utilize polymers derived from this monomer. Additionally, he has developed methods for preparing these compositions and techniques for forming photoresist patterns using them. Another significant patent involves an organometal-containing norbornene monomer, which is essential for manufacturing photoresist materials and forming patterns.
Career Highlights
Jae-Jun Lee is affiliated with the Korea Advanced Institute of Science and Technology, where he continues to push the boundaries of research in photoresist technology. His work has garnered attention for its potential applications in various industries, including semiconductor manufacturing.
Collaborations
Lee collaborates with esteemed colleagues such as Jin-Baek Kim and Tae-Hwan Oh, contributing to a dynamic research environment that fosters innovation.
Conclusion
Jae-Jun Lee's contributions to photoresist technology exemplify the impact of innovative thinking in advancing material science. His patents not only enhance the efficiency of photolithography processes but also pave the way for future developments in the field.