Jim Zibrida

Title: The Innovative Contributions of Jim Zibrida

Introduction

Jim Zibrida is a notable inventor based in Glendale, AZ (US). He has made significant contributions to the field of physical vapor deposition technology. His work focuses on enhancing the efficiency and effectiveness of ionized deposition methods.

Latest Patents

Zibrida holds a patent for a "Method and apparatus for increasing the metal ion fraction in ionized." This innovative patent describes an ionized physical vapor deposition method and apparatus that utilizes a magnetron magnetic field produced by a cathode magnet structure behind a sputtering target. This setup generates a main sputtering plasma, while an RF inductively coupled field produced by an RF coil outside the vacuum chamber creates a secondary plasma. This secondary plasma ionizes sputtered material as it travels from the target to the substrate, allowing for precise steering of the material to ensure optimal deposition.

Career Highlights

Jim Zibrida is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing deposition technologies that are crucial for the production of high-quality semiconductor devices.

Collaborations

Throughout his career, Zibrida has collaborated with talented professionals such as Jason Smolanoff and Doug Caldwell. These collaborations have fostered innovation and contributed to the development of cutting-edge technologies in the field.

Conclusion

Jim Zibrida's contributions to the field of physical vapor deposition are noteworthy. His innovative patent and work at Tokyo Electron Limited highlight his commitment to advancing technology in the semiconductor industry. His collaborations with other professionals further enhance the impact of his work.