Jim Su

Title: Jim Su - Innovator in Plasma Technology

Introduction

Jim Su is a notable inventor based in Cupertino, CA (US). He has made significant contributions to the field of plasma technology, particularly in the area of photoresist removal processes. His innovative approach has implications for the semiconductor manufacturing industry.

Latest Patents

Jim Su holds a patent for a "Method for removing photoresist from low-k films in a downstream plasma system." This unique photoresist strip sequence utilizes a downstream plasma system, which can include RF directional plasma alone, downstream plasma alone, or a combination of both. The process can be executed in a single step or multiple steps, achieving high strip rates while preserving the dielectric properties of the film. Additionally, the process can be an oxidizing one, conducted at low temperature and low pressure, which minimizes the reactivity of oxygen with the low-k film. By incorporating a small percentage of an additive gas, such as a fluorine-containing gas, the inorganic residues from the strip process are effectively removed, resulting in a clean film devoid of photoresist and residue.

Career Highlights

Jim Su is currently employed at Novellus Systems Incorporated, where he continues to advance his research and development efforts. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Jim has collaborated with esteemed colleagues, including Helmuth W Treichel and Chevan Goonetilleke. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Jim Su's innovative contributions to plasma technology and photoresist removal processes highlight his role as a key inventor in the semiconductor industry. His work not only advances technological capabilities but also sets new standards for efficiency and effectiveness in manufacturing.