Brush Prairie, WA, United States of America

Jim Plymale

This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jim Plymale. Retrieved from https://idiyas.com/inventor/jim-plymale

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Jim Plymale: Innovator in Printing Technology

Introduction

Jim Plymale is an accomplished inventor based in Brush Prairie, WA (US). He has made significant contributions to the field of printing technology, particularly through his innovative patent.

Latest Patents

Jim Plymale holds a patent for a printing mechanism and method. One embodiment of his printhead servicing mechanism includes a driveshaft and a sled that features a rack designed to selectively engage the driveshaft. Additionally, it incorporates a retaining wall positioned to keep the driveshaft on the rack within a designated zone. This invention showcases his expertise in enhancing printing efficiency and functionality.

Career Highlights

Jim Plymale is currently employed at Hewlett-Packard Development Company, L.P. His work at this prominent technology company has allowed him to further develop his skills and contribute to advancements in printing technology.

Collaborations

Throughout his career, Jim has collaborated with notable colleagues, including David J. Waller and Kris M. English. These partnerships have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

Jim Plymale is a notable inventor whose work in printing technology has led to valuable advancements in the field. His patent reflects his commitment to innovation and his contributions to the industry will continue to influence future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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