Jihyeong Lee

Title: Jihyeong Lee - Innovator in Substrate Processing Technologies

Introduction

Jihyeong Lee is an inventor based in Suwon-si, South Korea. He is known for his contributions to substrate processing technologies, particularly in the semiconductor industry. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

1. **SUBSTRATE SUPPORTER** - The present disclosure relates to substrate supporters and substrate processing apparatuses. An example substrate supporter includes an upper surface on which a substrate is loaded, a base, an outer dam extending along an edge of the base, a contact band connected with the outer dam, extending along the circumferential direction of the base, and onto which the substrate is loaded. Additionally, a first contact pattern is disposed adjacent to the contact band and extends into the inside of the contact band, where the first contact pattern extends along the circumferential direction of the base. Notably, the area of the first contact pattern is larger than the area where the contact band overlaps with the substrate.

2. **SUBSTRATE STAGE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME** - A substrate processing apparatus includes a chamber providing a space for performing a semiconductor process on a semiconductor substrate, and a substrate stage configured to support the semiconductor substrate. The substrate stage includes a platen having a seating surface to support the semiconductor substrate, with the platen having a resistance heater and an RF electrode adjacent to the seating surface. Furthermore, a shaft under the platen has a first through hole in a central region and a plurality of second through holes in a peripheral region surrounding the central region. An RF rod is spaced apart from an inner wall of the first through hole and is electrically connected to the RF electrode. Additionally, a plurality of heater rods are respectively within the plurality of second through holes and electrically connected to the resistance heater.

Conclusion

Jihyeong Lee is an innovative inventor whose work focuses on substrate processing technologies. His latest patent applications demonstrate his commitment to advancing semiconductor processing methods. As he continues to develop his ideas, he may contribute significantly to the field in the future.