Madison, WI, United States of America

Jieun Kim


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Jieun Kim: Innovator in Hybrid Pulsed Laser Deposition Technology

Introduction

Jieun Kim is a prominent inventor based in Madison, WI (US). He has made significant contributions to the field of materials science, particularly in the development of complex oxide thin films. His innovative work has led to advancements in the methods used for growing these films, which are essential in various technological applications.

Latest Patents

Jieun Kim holds 1 patent for his invention titled "Hybrid pulsed laser deposition of complex oxide thin films made from elements having a large vapor pressure mismatch." This patent describes apparatus and methods for growing films of complex layered metal oxides with high stoichiometries and high crystal qualities. The layered complex metal oxides include two or more metals and oxygen, featuring a unique layered structure. The hybrid pulsed laser deposition (hybrid PLD) method he developed synergistically combines the advantages of molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) to effectively grow complex metal oxide films that include metals with very different vapor pressures.

Career Highlights

Jieun Kim is associated with the Wisconsin Alumni Research Foundation, where he continues to push the boundaries of research in materials science. His work has garnered attention for its potential applications in various high-tech industries, including electronics and energy storage.

Collaborations

Throughout his career, Jieun Kim has collaborated with notable researchers, including Chang-Beom Eom and Jungwoo Lee. These collaborations have further enhanced the impact of his research and innovations in the field.

Conclusion

Jieun Kim's contributions to the field of hybrid pulsed laser deposition represent a significant advancement in the growth of complex oxide thin films. His innovative methods and collaborative efforts continue to influence the landscape of materials science and technology.

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