Jiehua Li

Title: Innovations of Jiehua Li in Sputtering Technology

Introduction

Jiehua Li is a notable inventor based in Leoben, Austria. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets. His work is characterized by a focus on innovative alloy compositions that enhance the performance of sputtering processes.

Latest Patents

Jiehua Li holds a patent for a sputtering target composed of an alloy consisting of 5 to 70 atomic percent of at least one element from the group of Gallium (Ga) and Indium (In), along with 0.1 to 15 atomic percent of Sodium (Na). The remainder of the alloy is Copper (Cu) and typical impurities. This sputtering target includes at least one intermetallic Na-containing phase, which is crucial for improving the efficiency and effectiveness of sputtering applications.

Career Highlights

Li is currently employed at Plansee SE, a company renowned for its expertise in high-performance materials. His role involves research and development, where he applies his knowledge to create advanced materials for various industrial applications. His innovative approach has positioned him as a key figure in the field.

Collaborations

Jiehua Li collaborates with several talented professionals, including Christian Linke and Peter Schumacher. These collaborations foster a dynamic environment for innovation and contribute to the advancement of technology in their field.

Conclusion

Jiehua Li's contributions to sputtering technology through his innovative patent and collaborative efforts at Plansee SE highlight his importance in the materials science community. His work continues to influence advancements in the industry.