Jie Shen

Title: Jie Shen: Innovator in Fabrication Methods

Introduction

Jie Shen is a notable inventor based in Delft, Netherlands. He has made significant contributions to the field of fabrication methods, holding 2 patents that showcase his innovative approach to selectively patterning device structures. His work is instrumental in advancing technology in various applications.

Latest Patents

Jie Shen's latest patents focus on advanced fabrication methods. One of his notable inventions involves a method of selectively patterning a device structure using a hollow shadow wall formed on a substrate. This shadow wall consists of a base lying on the substrate's surface, with one or more side walls extending away from the surface to define an internal cavity. The method allows for selective deposition of material on the device structure, utilizing a deposition beam at a non-zero angle of incidence. This innovative approach ensures that the shadow wall prevents deposition on specific areas of the device structure, thereby achieving precise patterning. Once the device structure is patterned, the side walls of the hollow shadow wall are removed, completing the selective patterning process.

Career Highlights

Jie Shen is currently employed at Microsoft Technology Licensing, LLC, where he continues to develop and refine his innovative techniques in fabrication methods. His work at Microsoft has allowed him to collaborate with leading experts in the field, further enhancing his contributions to technology.

Collaborations

Some of Jie Shen's coworkers include Senja Ramakers and Pavel Aseev. Their collaboration fosters a dynamic environment for innovation and development in fabrication technologies.

Conclusion

Jie Shen's contributions to the field of fabrication methods exemplify his innovative spirit and dedication to advancing technology. His patents reflect a deep understanding of device structure patterning, making him a valuable asset in the industry.