Beijing, China

Jichuang Xu

This inventor holds 1 USPTO granted patent. Top assignee: Honeywell International Inc.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jichuang Xu. Retrieved from https://idiyas.com/inventor/jichuang-xu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Jichuang Xu: Innovator in RFID Technology

Introduction

Jichuang Xu is a notable inventor based in Beijing, China. He has made significant contributions to the field of Radio Frequency Identification (RFID) technology. His innovative work focuses on enhancing the efficiency of entry and exit confirmation systems.

Latest Patents

Jichuang Xu holds a patent for an "Entry and Exit Confirmation System and Method." This invention provides a method for confirming the entry and/or exit state of a mobile object relative to all entrances of an underground passageway. The system utilizes RFID technology, where at least one RFID tag is physically attached to the mobile object. The method involves generating data based on the mobile object's interaction with RFID readers positioned at strategic locations.

Career Highlights

Jichuang Xu is currently employed at Honeywell International Inc., where he continues to develop innovative solutions in the field of technology. His work has been instrumental in advancing the applications of RFID systems in various industries.

Collaborations

He has collaborated with notable colleagues, including KaiLai Zhang and Wenhao Qin, to further enhance the capabilities of their projects and innovations.

Conclusion

Jichuang Xu's contributions to RFID technology exemplify the impact of innovative thinking in modern engineering. His patent reflects a commitment to improving systems that enhance operational efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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