Beijing, China

Jiawen Tu

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Henrich Technology Co., Ltd. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jiawen Tu. Retrieved from https://idiyas.com/inventor/jiawen-tu-kip4yfm6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jiawen Tu and a Ranging and Ballistic Display Optical Sight.

Introduction

Jiawen Tu is an inventor based in Beijing, China. Her work includes an optical sight designed to measure distance and display ballistic information to support more precise and efficient shooting.

Latest Patents

The provided information lists one patent for Jiawen Tu: “Ranging and Ballistic Display Optical Sight.” The invention combines a mounting bracket, control mainboard, laser emitter, and receiver with an objective lens group and beam splitter prism. The prism directs the emitted laser beam to the receiver, while the control mainboard calculates distance from the time between emission and reception. A digital reticle plate displays the resulting range data along the optical path. The listed patent count is 1 patent.

Career Highlights

Jiawen Tu is associated with Henrich Technology Co., Ltd. Her listed invention brings laser ranging and ballistic information together in an optical sight, with the aim of improving shooting precision and efficiency.

Collaborations

The provided information names Wei Zhou and Congcong Sha as Jiawen Tu’s coworkers. It does not specify their roles or contributions to the invention.

Conclusion

Jiawen Tu’s listed patent reflects an approach to integrating laser-based distance measurement with an optical sight’s display, connecting her inventive work with Henrich Technology Co., Ltd.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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