Jiao Duan

Title: Jiao Duan: Innovator in Plasma Resistant Coatings

Introduction

Jiao Duan is a prominent inventor based in Shanghai, China. She has made significant contributions to the field of plasma processing technology. Her innovative work focuses on developing methods and apparatuses that enhance the durability of components exposed to plasma environments.

Latest Patents

Jiao Duan holds a patent for a "Method and apparatus for forming a plasma resistant coating, component, and plasma processing apparatus." This patent discloses a method of forming a plasma coating on a component, along with the apparatus required for the coating process. The apparatus includes a vacuum chamber, a first coating material source containing oxygen and yttrium atoms, and a second coating material source that may include yttrium fluoride, aluminum-oxygen compound, or zirconium-oxygen compound. The innovative design features exciting devices that facilitate a chemical reaction, resulting in a plasma resistant coating with strong corrosion resistance properties. Jiao Duan has 1 patent to her name.

Career Highlights

Jiao Duan is currently employed at Advanced Micro-Fabrication Equipment Inc. in China. Her work at this company has allowed her to push the boundaries of plasma processing technology. She has been instrumental in developing solutions that improve the performance and longevity of various components used in high-tech applications.

Collaborations

Jiao has collaborated with notable colleagues, including Sheng Guo and Xiang Sun. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Jiao Duan's contributions to the field of plasma resistant coatings exemplify her dedication to advancing technology. Her innovative methods and collaborative spirit continue to influence the industry positively.