Singapore, Singapore

Jiann Liu

This inventor holds 1 USPTO granted patent. Top assignee: Texas Instruments Corporation. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jiann Liu. Retrieved from https://idiyas.com/inventor/jiann-liu-569fng4a

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovations of Jiann Liu

Introduction

Jiann Liu is a notable inventor based in Singapore, SG. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that showcases his expertise and creativity.

Latest Patents

Jiann Liu holds a patent for an "Implant screen and method." This semiconductor device comprises a semiconductor layer with an outer surface. A plurality of gates is disposed over the outer surface of the semiconductor layer. An isolation cover is placed over the gates, and an implant screen is grown on the outer surface of the semiconductor layer between the isolation covers of the gates. This invention highlights Liu's ability to advance semiconductor technology.

Career Highlights

Jiann Liu is currently employed at Texas Instruments Corporation, where he continues to innovate and contribute to the field. His work at this esteemed company has allowed him to collaborate with other talented professionals in the industry.

Collaborations

Some of Jiann Liu's coworkers include Siang Ping Kwok and William F Richardson. Their collaboration fosters a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Jiann Liu's contributions to semiconductor technology through his patent and work at Texas Instruments Corporation exemplify his dedication to innovation. His achievements reflect the importance of collaboration and creativity in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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