Hsin-Chu, Taiwan

Jiann-Kwang Wang


Average Co-Inventor Count = 5.7

ph-index = 4

Forward Citations = 466(Granted Patents)


Location History:

  • Hsiu-Chu, TW (1998)
  • Hsin Chu, TW (1993 - 2006)

Company Filing History:


Years Active: 1993-2006

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5 patents (USPTO):Explore Patents

Title: **Innovator Jiann-Kwang Wang: Advancements in CMP Processes**

Introduction

Jiann-Kwang Wang, an esteemed inventor based in Hsin-Chu, Taiwan, has made significant contributions to the field of semiconductor manufacturing. With a robust portfolio that includes five patents, Wang's work has influenced industry practices, particularly in chemical mechanical polishing (CMP) processes.

Latest Patents

One of Jiann-Kwang Wang's notable innovations addresses two prevalent issues in traditional CMP: the retention of slurry particles on the polished surface and the formation of residual oxide layers. His innovative approach involves the addition of TMAH or TBAH to the slurry, which enhances the hydrophobic properties of the surface being polished. This improvement ensures that no residual layers of oxide remain after CMP, and minimal slurry abrasive particles cling to the freshly polished surface. Furthermore, these remaining particles can be easily removed with a simple rinse or buffing technique. Alternatively, Wang has proposed a three-stage CMP process that includes conventional CMP, polishing in a solution of TMAH or TBAH, followed by a gentle rinse or buffing.

Career Highlights

Jiann-Kwang Wang is affiliated with Taiwan Semiconductor Manufacturing Company Ltd., where he continues to work on cutting-edge innovations. His role within this leading company emphasizes his commitment to improving semiconductor fabrication techniques and ensuring the highest quality in production processes.

Collaborations

Throughout his career, Wang has collaborated with prominent colleagues such as Ying-Lang Wang and Shih-Chi Lin. Together, they have worked on various projects that have furthered the development of more efficient processes in semiconductor manufacturing.

Conclusion

Jiann-Kwang Wang is a significant figure in the world of semiconductor innovations. With his contributions to CMP processes, he has paved the way for advancements that enhance the efficiency and effectiveness of semiconductor manufacturing. His inventive spirit and collaborative efforts exemplify the essential role of innovation in driving industry progress.

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