Guangzhou, China

Jianhua Guo

This inventor holds 1 USPTO granted patent. Top assignee: Guangdong Polytechnic Normal University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jianhua Guo. Retrieved from https://idiyas.com/inventor/jianhua-guo-e2mffyh0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jianhua Guo: Innovator in Binary Dot Matrix Code Identification

Introduction

Jianhua Guo is a notable inventor based in Guangzhou, China. He has made significant contributions to the field of image processing and identification technologies. His innovative work focuses on methods for identifying binary dot matrix codes on mold surfaces.

Latest Patents

Jianhua Guo holds a patent titled "Method for identifying binary dot matrix code on mold surface." This patent describes a comprehensive process that involves capturing multiple images of binary dot matrix codes, training a YOLOv8 network model, and utilizing advanced detection techniques to decode binary-encoded sequence data. The method enhances the accuracy and efficiency of identifying codes on mold surfaces, showcasing Guo's expertise in the field.

Career Highlights

Jianhua Guo is affiliated with Guangdong Polytechnic Normal University, where he contributes to research and development in technology and engineering. His work has garnered attention for its practical applications in various industries, particularly in manufacturing and quality control.

Collaborations

Jianhua Guo collaborates with esteemed colleagues such as Peng Liang and Hong Zhang. Their combined efforts in research and innovation have led to advancements in their respective fields.

Conclusion

Jianhua Guo's contributions to the identification of binary dot matrix codes exemplify his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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