Jiangsu, China

Jianguo Shang

This inventor holds 1 USPTO granted patent. Top assignee: Jiangsu Maat Optical Technology Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jianguo Shang. Retrieved from https://idiyas.com/inventor/jianguo-shang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jianguo Shang and Photochromic Bifocal Lens Technology.

Introduction

Jianguo Shang is an inventor associated with Jiangsu, China, and Jiangsu Maat Optical Technology Co., Ltd. His disclosed work combines photochromic technology with bifocal lens design.

Latest Patents

Shang is associated with 1 patent: “Photochromic Lens with Bifocal Film Layer and Preparation Method for Photochromic Lens.” The invention describes a lens comprising a substrate, a treatment layer, and an outer photochromic layer cured onto the treatment layer using ultraviolet irradiation. It uses a bifocal lens as the substrate and combines bifocal and photochromic technologies to address unevenness in the film layer that can result from spin coating. The method aims to produce a uniformly attached photochromic layer while preserving the bifocal substrate’s surface shape and optical power.

Career Highlights

Shang’s patent work focuses on lens preparation and the integration of optical functions. The disclosed approach seeks to provide uniform photochromic performance without compromising the characteristics of the bifocal lens substrate.

Collaborations

Shang is associated with Jiangsu Maat Optical Technology Co., Ltd. His coworker, Jun Li, is also identified in connection with the provided information.

Conclusion

Jianguo Shang’s patent describes a preparation method that brings photochromic and bifocal lens technologies together, with the goal of achieving a uniform coating while maintaining the substrate’s optical properties.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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