Shanghai, China

Jiangpeng Xue


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2010-2011

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2 patents (USPTO):Explore Patents

Title: Jiangpeng Xue: Innovator in SONOS Flash Memory Technology

Introduction

Jiangpeng Xue is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of SONOS flash memory. With a total of 2 patents to his name, Jiangpeng has established himself as a key figure in innovation within the semiconductor industry.

Latest Patents

Jiangpeng Xue's latest patents focus on methods for fabricating silicon-oxide-nitride-oxide-silicon (SONOS) flash memory. One of his notable inventions involves a detailed process that includes preparing a silicon substrate with an ONO layer, a first polysilicon layer, and a first etch stop layer. The method emphasizes selective etching of the first polysilicon layer, which allows for the exposure of the ONO layer while preventing polysilicon residue on the sidewalls of the dielectric layer. This innovation is crucial in avoiding short circuits between different memory cells, enhancing the reliability of SONOS flash memory.

Career Highlights

Jiangpeng Xue is currently employed at Semiconductor Manufacturing International Corporation (SMIC) in Shanghai. His work at SMIC has positioned him at the forefront of semiconductor manufacturing, where he continues to innovate and improve memory technologies. His expertise in the fabrication of SONOS flash memory has garnered attention within the industry.

Collaborations

Jiangpeng has collaborated with notable colleagues such as Haitao Jiang and Xinsheng Zhong. These partnerships have contributed to the advancement of semiconductor technologies and have fostered a collaborative environment for innovation.

Conclusion

Jiangpeng Xue is a distinguished inventor whose work in SONOS flash memory technology has made a significant impact on the semiconductor industry. His innovative methods and dedication to improving memory fabrication processes highlight his role as a leading figure in technological advancements.

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