This inventor holds 1 USPTO granted patent. Top assignee: Tenneco (Suzhou) Emission System Co., Ltd.. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Jianghua Wang - Innovator in Exhaust Gas Post-Treatment Technology
Introduction
Jianghua Wang is a notable inventor based in Jiangsu, China. He has made significant contributions to the field of exhaust gas treatment technology. His innovative approach has led to the development of a unique apparatus designed to enhance the efficiency of exhaust gas post-treatment systems.
Latest Patents
Jianghua Wang holds a patent for an "Exhaust Gas Post-Treatment Apparatus." This apparatus comprises a first mixing chamber assembly and a second mixing chamber assembly. The first mixing chamber assembly includes a first housing with a first mixing chamber, a gas inlet pipe, and a first mixing pipe that is partially located within the first mixing chamber. Additionally, it features a perforated pipe situated in the first mixing pipe. The design ensures that the perforated area of the perforated pipe fully covers the length of the flow plates, optimizing the mixing process.
Career Highlights
Jianghua Wang is currently employed at Tenneco (Suzhou) Emission System Co., Ltd. His work focuses on developing advanced technologies that contribute to cleaner emissions and improved environmental standards. With a patent portfolio that includes 1 patent, he continues to push the boundaries of innovation in his field.
Collaborations
Jianghua has collaborated with talented coworkers such as Cong Wang and Shuo Li. Their combined expertise fosters a creative environment that drives innovation and enhances the development of new technologies.
Conclusion
Jianghua Wang's contributions to exhaust gas post-treatment technology exemplify his commitment to innovation and environmental sustainability. His work at Tenneco and his patented inventions highlight his role as a key player in advancing emission control technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile