Funabashi, Japan

Jian Rong Xie

This inventor holds 1 USPTO granted patent. Top assignee: Toyo Gosei Kogyo, Ltd.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jian Rong Xie. Retrieved from https://idiyas.com/inventor/jian-rong-xie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovations of Jian Rong Xie

Introduction

Jian Rong Xie is a notable inventor based in Funabashi, Japan. He has made significant contributions to the field of photosensitive compounds and resin compositions. His work focuses on developing environmentally friendly materials that exhibit high performance in various applications.

Latest Patents

Jian Rong Xie holds a patent for photosensitive compounds, photosensitive resin compositions, and patterns. The photosensitive compound of his invention contains specific units and is expressed by a unique formula. This novel photosensitive resin compound allows for the preparation of different photosensitive resin compositions that do not contribute to environmental pollution. These compositions exhibit high resolution, possess a high level of sensitivity, and demonstrate excellent adhesion with substrates, along with superior coating characteristics and storage stability.

Career Highlights

Jian Rong Xie is associated with Toyo Gosei Kogyo, Ltd., where he continues to innovate in the field of materials science. His work has garnered attention for its potential applications in various industries, particularly in electronics and coatings.

Collaborations

Some of his notable coworkers include Toru Shibuya and Noriaki Tochizawa, who have collaborated with him on various projects within the company.

Conclusion

Jian Rong Xie's contributions to the field of photosensitive materials highlight his commitment to innovation and environmental sustainability. His work continues to influence advancements in technology and materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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