Company Filing History:
Years Active: 2013-2016
Title: Jiamin Qian: Innovator in Microelectronics
Introduction
Jiamin Qian is a notable inventor based in Shanghai, China. He has made significant contributions to the field of microelectronics, particularly through his innovative patents. With a total of 2 patents, Qian's work focuses on enhancing the reliability and performance of microelectronic devices.
Latest Patents
One of Jiamin Qian's latest patents involves the development of through silicon via guard rings. This invention relates to forming a plurality of through silicon vias guard rings proximate the scribes streets of a microelectronic device wafer. The microelectronic device wafer includes a substrate wherein the through silicon via guard ring is fabricated by forming vias that extend completely through the substrate. These guard rings act as crack arresters, significantly reducing or eliminating defects caused by cracks resulting from the dicing of the microelectronic wafer.
Career Highlights
Jiamin Qian is currently employed at Intel Corporation, where he continues to push the boundaries of microelectronic technology. His work has been instrumental in improving the durability and efficiency of microelectronic devices, making them more reliable for various applications.
Collaborations
Throughout his career, Qian has collaborated with talented individuals such as Cheng Yang and Hai Wu. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Jiamin Qian's contributions to the field of microelectronics through his patents and work at Intel Corporation highlight his role as a key innovator. His inventions, particularly in the area of through silicon via guard rings, demonstrate his commitment to advancing technology and improving device reliability.