Shanghai, China

Jiale Qu

This inventor holds 1 USPTO granted patent. Top assignee: Sap Se. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jiale Qu. Retrieved from https://idiyas.com/inventor/jiale-qu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Jiale Qu

Introduction

Jiale Qu is a notable inventor based in Shanghai, China. He has made significant strides in the field of database computation, particularly with his innovative approach utilizing parallel computation.

Latest Patents

Jiale Qu holds a patent titled "Database calculation using parallel-computation in a directed acyclic graph." This invention focuses on technologies that optimize database calculations by employing parallel computation of tasks arranged in a directed acyclic graph. The method involves converting task dependencies into a directed acyclic graph that topologically sorts tasks into layers, allowing for efficient parallel computation within each layer.

Career Highlights

Qu is currently associated with SAP SE, a leading multinational software corporation known for its enterprise resource planning software. His work at SAP highlights his commitment to advancing technological efficiencies through innovative database solutions.

Collaborations

Throughout his career, Jiale Qu has collaborated with esteemed colleagues such as Jing Gu and Jie Zhao. These partnerships have contributed to his successful patent application and the development of cutting-edge technologies in database computations.

Conclusion

Jiale Qu's contributions to the field of database calculation stand as a testament to his innovative spirit and expertise. With his patent and collaboration with industry leaders, he is poised to continue making a lasting impact in the realm of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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