Company Filing History:
Years Active: 2024
Title: Jiabin Lu: Innovator in Magnetorheological-Elastomer Technology
Introduction
Jiabin Lu is a prominent inventor based in Guangdong, China. He has made significant contributions to the field of semiconductor manufacturing through his innovative work on magnetorheological-elastomer (MRE) polishing pads. His inventions are aimed at enhancing the efficiency and effectiveness of chemical mechanical polishing processes.
Latest Patents
Jiabin Lu holds a patent for a "Magnetorheological-elastomer polishing pad for chemical mechanical polishing of semiconductor wafer, preparation method and application thereof." This invention discloses a polishing pad that is suitable for chemical mechanical polishing (CMP) of semiconductor wafers. The MRE polishing pad enables high-efficiency magnetic control polishing while also facilitating a high-efficiency Fenton reaction. The pad is designed to form an organosilicon-polyurethane matrix, which combines the flexibility and mechanical properties of organosilicon materials. The incorporation of CIP@FeO composite magnetic particles allows the polishing pad to exhibit a high magnetorheological effect, which aids in the oxidation of the semiconductor wafer surface, thereby reducing the difficulty of material removal during the polishing process.
Career Highlights
Jiabin Lu is affiliated with the Guangdong University of Technology, where he continues to advance research in materials science and engineering. His work has garnered attention for its practical applications in the semiconductor industry, particularly in improving the efficiency of wafer polishing techniques.
Collaborations
Jiabin Lu collaborates with notable colleagues, including Da Hu and Haotian Long, who contribute to his research endeavors and help in the development of innovative solutions in the field.
Conclusion
Jiabin Lu's contributions to the field of semiconductor manufacturing through his innovative polishing pad technology highlight his role as a key inventor in this area. His work not only enhances the efficiency of semiconductor processing but also showcases the potential of magnetorheological-elastomer materials in industrial applications.