Location History:
- Amherst, MA (US) (2013)
- Chicago, IL (US) (2013 - 2017)
Company Filing History:
Years Active: 2013-2017
Title: Innovations of Inventor Jia-Yu Wang
Introduction
Jia-Yu Wang is a prominent inventor based in Chicago, IL (US). He has made significant contributions to the field of nanotechnology, particularly in the development of nanopatterned articles. With a total of 4 patents to his name, Wang's work has garnered attention for its innovative approaches and practical applications.
Latest Patents
Wang's latest patents focus on the production of nanopatterned articles using reconstructed block copolymer films. One of his notable inventions involves a method for preparing nanopatterned surfaces by forming a block copolymer film on a substrate. This process includes annealing and surface reconstructing the film to create an array of cylindrical voids. Following this, a metal is deposited on the surface-reconstructed film, and heating is applied to redistribute some of the metal into the cylindrical voids. Depending on the thickness of the metal layers and the heating temperatures used, the resulting structures can either form metal nanodots or nanoring-shaped voids. These nanopatterned surfaces can be transferred to underlying substrates via etching or utilized to prepare nanodot- or nanoring-decorated surfaces.
Career Highlights
Jia-Yu Wang is affiliated with the University of Massachusetts, where he continues to advance his research in nanotechnology. His work has not only contributed to academic knowledge but also has potential industrial applications.
Collaborations
Wang collaborates with esteemed colleagues such as Thomas P. Russell and Soojin Park, enhancing the scope and impact of his research endeavors.
Conclusion
Jia-Yu Wang's innovative work in nanopatterned articles exemplifies the intersection of creativity and technology. His contributions to the field of nanotechnology are paving the way for future advancements and applications.